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ELECTROPLATING PROCESS   

Copper

Copper Process-Cupsal Z
APPLICATIONS: A sodium cyanide based solution recommended where simplicity and economy are important. Slow speed solution suitable for manual plant and general-purpose light copper plating. The desposit is dull.
OPERATING CONDITIONS: 50 to 130 g/l, 50 to 55C, 0.5 to 1.0 A/dm2
High Efficiency Copper Process-Cupsal CX
APPLICATIONS: A potassium cyanide based solution which produces a fine grained deposit. A high speed solution with excellent throwing power. Suitable for thick copper deposits and as an undercoat for bright nickel on steel and zinc based dicastings. Rack or barrel use.
OPERATING CONDITIONS: 160 to 210 g/l, 55 to 65C, 2 to 4 A/dm2 with periodic reverse current. pH 11.5 to 12.5.
High Efficiency Bright Copper-Cupsal CB
APPLICATIONS: A potassium cyanide based solution which produces bright deposit. A high speed solution with excellent throwing power. Fully bright deposit ideal for use on zinc based diecastings.
OPERATING CONDITIONS: 150to 200 g/l, 50 to 55.C, 2 to 4 A/dm2, pH 11.5 to 12.5
Acid Copper-Cupsal AD
APPLICATIONS: A fully bright acid copper with extremely high leveling power suitable for decorative use and electroforming. For plating steel, since alloys and plastic components.
OPERATING CONDITIONS: Cupsal AD Base Salt - 200 g/l, + H2So4 + Brightener Cupasl ADA - 10m/l, 18 to 30C, 2 to 7.5 A/dm
Rochelle Copper-Cupsal RH
APPLICATIONS: A mildly alkaline, low cyanide based cooper plating process, designed for zinc based alloy diecastings.
OPERATING CONDITIONS: 125 5o 200 g/l, 50 to 60.C, 1 to 5 A/dm2.

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